Date & Venue
Tuesday, 26 March 2019, 3:00pm
EF122
Abstract
The next generation of integrated circuits will be mass produced using extreme ultra violet lithography (EUV). The short wavelength light sources and optical masks required are prohibitively expensive with commercial systems costing upwards of $1M. Furthermore, the optical masks are unique to each IC design. Two photon near field exposure provides a cheaper alternative that is better suited to prototyping and low volume production. By using the localised field produced by plasmons on a metal probe, the diffraction limit can be circumvented allowing resolutions comparable to EUV to be achieved using affordable laser sources. Furthermore, an optical mask is not required. Modelling the plasmon response of metallic nanoparticles has identified the key parameters determining the performance of two photon near field lithography, and these results will be presented.
Speaker Biography
Luke R. McCourt graduated from The University of Newcastle, Australia with a Bachelor of Science (Physics) (Honours Class 1) in 2016. He is currently a PhD student within the Precision Mechatronics Lab, located in the School of Electrical Engineering and Computing, The University of Newcastle. His research areas include non-linear optical systems and optical maskless lithography.