Luke McCourt: Two Photon Near Field Lithography
Date & Venue Tuesday, 26 March 2019, 3:00pm EF122 Abstract The next generation of integrated circuits will be mass produced using extreme ultra violet lithography (EUV). The short wavelength light sources and optical masks required are prohibitively expensive with commercial systems costing upwards of $1M. Furthermore, the optical masks are unique to each IC design. [...]